Taiwan‘s Largest CVD/ALD Precursors Manufacturer
One of the few high tech CVD/ALD advanced materials companies in the world with complete technical services from the front-end (synthesis/purification/analysis) process integration to the back-end (packaging/container manufacturing/valves overhaul).
Nanmat provides high quality chemical vapor deposition materials (CVD/ALD Precursors) for semiconductor customers, including the most advanced high k and low k dielectrics materials, and customizes synthesis, purification and packaging to improve process quality yields.
Canister Customized Design & Liquid level gauge
Liquid Delivery System & Filter
Valve and Pipeline Cleaning Services
The Most Co$t-effective Solution
Nanmat has been established in the Kaohsiung Nanzi Processing Zone since 1998 (currently renamed: Kaohsiung Nanzi Technology Industrial Park), and is a local company dedicated to the development of semiconductor CVD/ALD (Chemical Vapor Deposition /Atomic Layer Deposition) in Taiwan.
Professional research and manufacturing of various advanced CVD/ALD (Chemical Vapor Deposition /Atomic Layer Deposition) materials. It is one of the few in the world that can provide integration from the front end (synthesis, purification, analysis) process to the back end (filling, packaging, container manufacturing, and technology service) high tech advanced materials company.
After more than 20 years of research and innovation, the products have been recognized and adopted by international semiconductor manufacturing companies, and they have already occupied a considerable share of the semiconductor materials market by major international manufacturers. At present, the customer base has spanned across Asia and the Americas and gradually expanded to the global market. In order to integrate customer needs, Nanmat provides the following products and services
* CVD/ALD Precursors
* Liquid Delivery System
* Precursors's Filter
* Liquid Level Detecting System
* Customized service for material development and canister design
* Valve Cleaning and Reclamation
Application | Product NAME |
---|---|
Dielectrics PMD / IMD |
• TEOS / TEPO / TMPO / TEB / TMB |
Low K Dielectrics |
• 4MS / OMCTS / DMDMOS |
High K Dielectrics |
• TAETO (Ta2O5 Precursor ) |
Metal Gate and Interconnect Metal |
• TDMAT ( TiN Precursor ) |
Low-Temp Nitride / Oxide |
• HCDS / 3DMAS / BTBAS |
Dopants |
• Trans DCE |
SAM Coating |
• FDTS / BTCSE / DI Water |